MIT:optical lithography applicable for 12 - nm tehprotsessa

 
June 3, 2008, 6:14 am

   There was a time when nobody believed that using traditional tools and common optical lithography will be produced chips with the standards of 45 - nm tehprotsessa. Yes there 45 - nm:at one time been questioned even the possibility of working with 65 - nm rules. However, developers of the Massachusetts Institute of Technology (Massachusetts Institute of Technology, MIT) this week struck to meet even the types of statement that the life of optical lithography could be extended up to 12 - nm tehprotsessa inclusive.
Representatives of the laboratory Space Nanotecnology Laboratory at MIT have demonstrated the successful results of experiments using 25 - nm standards, using new technology, called"interference scanning beam lithography"(scanning beam interference lithography). Thanks to scientists conducted experiments on the full claim on the grounds that using optical lithography interferensnoy technology is limited unless the uneven surfaces of the material and is applicable until 12 - nm tehprotsessov.
interferensnoy lithography feature is the use of lasers in conjunction with two different wavelengths, as a result of interference which arises mesh figure higher resolution than this can be done from each laser individually. Without limiting the application of optical lithography interferensnoy narrow the scope of their use to work with the photo, so researchers added to this technology scanning. Application interferensnoy scanning beam lithography causes constant movement of water, unlike traditional interferensnoy lithography, where the water motionless, and this is offset by the frequency of lasers Doppler effect. Researchers from MIT have solved this problem sync images mesh with the movement of water using sound waves that vibrate to the beat of crystals with lasers and synchronously their frequency shifts up and down.
In any case, but the technology already on the path to commercialization, for the most recently created lithographic company Plymouth Grating Laboratory (Plymouth, Mass. ). Funding research laboratory produced Space Nanotechnology Laboratory, Institute for Astrophysics Kavli Institute of Astrophysics, NASA and the Foundation National Science Foundation.

 

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• interference lithography harvard mit
• Optical lithography good to 12 nanometers
• MIT:Optical lithography good to 12 nanometers
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